Synopsys, Inc. (NASDAQ: SNPS) announced the qualification and immediate availability of the Star-RCXT(TM) parasitic extraction solution for TSMC’s 45-nanometer (nm) process technology. The qualification is the result of collaboration between Synopsys, Altera, and TSMC to develop and silicon-validate advanced modeling of key process variation effects that impact the performance of digital, analog and memory circuits. Altera is now deploying Synopsys’ Star-RCXT as the preferred extraction tool for its 45-nm design sign-off flow.
Synopsys, Altera, and TSMC worked together to develop modeling specifications for two key 45nm interconnect process effects-microloading and gate-to-contact coupling capacitance variation. TSMC and Altera validated that the Synopsys Star-RCXT solution provides accurate modeling of these and other 45nm process effects caused by lithography variation, chemical-mechanical polishing (CMP), width-dependent temperature variation, and dielectric damage in ultra-low-K process.